000 | 01499cam a2200337 a 4500 | ||
---|---|---|---|
008 | 050512s1987 dcua b 101 0 eng | ||
010 | _a87-014573 | ||
020 | _a0841214069 | ||
035 | _avtls008153322 | ||
035 | _a4313092 | ||
039 | 9 |
_y200505120839 _zmschk03 |
|
040 |
_aSTUSCHK1 _bslo _cSTUSCHK1 |
||
082 | 0 | 0 |
_a668.9 _219 |
245 | 0 | 0 |
_aPolymers for high technology : _belectronics and photonics / _cMurrae J. Bowden, editor, S. Richard Turner, editor ; developed from a symposium sponsored by the Division of Polymeric Materials--Science and Engineering at the 192nd Meeting of the American Chemical Society, Anaheim, California, September 7-12, 1986. |
260 |
_aWashington, DC _bThe Society _c1987. |
||
300 |
_ax, 628 p. _bill. _c24 cm. |
||
440 | 0 |
_aACS symposium series, _x0097-6156 ; _v346 |
|
504 | _aIncludes bibliographies and indexes. | ||
650 | 0 |
_aPolymers _xCongresses. |
|
650 | 0 |
_aPhotoresists _xCongresses. |
|
650 | 0 |
_aMicrolithography _xMaterials _xCongresses. |
|
650 | 0 |
_aMicroelectronics _xMaterials _xCongresses. |
|
700 | 1 |
_aBowden, M. J., _d1943- |
|
700 | 1 |
_aTurner, S. Richard, _d1942- |
|
710 | 2 |
_aAmerican Chemical Society. _bDivision of Polymeric Materials: Science and Engineering |
|
710 | 2 |
_aAmerican Chemical Society. _bMeeting _n(192. : _d1986 : _cAnaheim, Calif.) |
|
906 |
_a7 _bcbc _corignew _d1 _eocip _f19 _gy-gencatlg |
||
910 | _aSCHK95 | ||
919 | _a0-8412-1406-9 | ||
991 |
_bc-GenColl _hTK7871.15.P6 _iP627 1987 _p00000725705 _tCopy 1 _wBOOKS |
||
999 |
_c3221 _d3221 |