000 01499cam a2200337 a 4500
008 050512s1987 dcua b 101 0 eng
010 _a87-014573
020 _a0841214069
035 _avtls008153322
035 _a4313092
039 9 _y200505120839
_zmschk03
040 _aSTUSCHK1
_bslo
_cSTUSCHK1
082 0 0 _a668.9
_219
245 0 0 _aPolymers for high technology :
_belectronics and photonics /
_cMurrae J. Bowden, editor, S. Richard Turner, editor ; developed from a symposium sponsored by the Division of Polymeric Materials--Science and Engineering at the 192nd Meeting of the American Chemical Society, Anaheim, California, September 7-12, 1986.
260 _aWashington, DC
_bThe Society
_c1987.
300 _ax, 628 p.
_bill.
_c24 cm.
440 0 _aACS symposium series,
_x0097-6156 ;
_v346
504 _aIncludes bibliographies and indexes.
650 0 _aPolymers
_xCongresses.
650 0 _aPhotoresists
_xCongresses.
650 0 _aMicrolithography
_xMaterials
_xCongresses.
650 0 _aMicroelectronics
_xMaterials
_xCongresses.
700 1 _aBowden, M. J.,
_d1943-
700 1 _aTurner, S. Richard,
_d1942-
710 2 _aAmerican Chemical Society.
_bDivision of Polymeric Materials: Science and Engineering
710 2 _aAmerican Chemical Society.
_bMeeting
_n(192. :
_d1986 :
_cAnaheim, Calif.)
906 _a7
_bcbc
_corignew
_d1
_eocip
_f19
_gy-gencatlg
910 _aSCHK95
919 _a0-8412-1406-9
991 _bc-GenColl
_hTK7871.15.P6
_iP627 1987
_p00000725705
_tCopy 1
_wBOOKS
999 _c3221
_d3221