000			01624cam a2200373 a 4500
008			050512s1994 dcua b 101 0 eng
010			_a93-042023
020			_a0841228485 (alk. paper)
035			_avtls008153616
035			_a4416811
039		9	_y200505121357 _zmschk03
040			_aSTUSCHK1 _bslo _cSTUSCHK1
082	0	0	_a621.3815/31 _220
245	0	0	_aIntroduction to microlithography / _cedited by Larry F. Thompson, C. Grant Willson, Murrae J. Bowden.
250			_a2nd ed.
260			_aWashington, DC _bAmerican Chemical Society _c1994.
300			_axiv, 527 p. _bill. _c24 cm.
440		0	_aACS professional reference book
504			_aIncludes bibliographical references and index.
505	0		_aAn introduction to lithography / Larry F. Thompson -- The lithographic process / Murrae J. Bowden -- Organic resist materials / C. Grant Willson -- Resist processing / Larry Thompson -- Plasma etching / J.A. Mucha, D.W. Hess, and E.S. Aydil.
650		0	_aMicrolithography _xCongresses.
650		0	_aPhotoresists _xCongresses.
650		0	_aPlasma etching _xCongresses.
650		0	_aSemiconductors _xEtching _xCongresses.
700	1		_aThompson, L. F., _d1944-
700	1		_aWillson, C. G. _q(C. Grant), _d1939-
700	1		_aBowden, M. J., _d1943-
906			_a7 _bcbc _corignew _d1 _eocip _f19 _gy-gencatlg
910			_aSCHK95
919			_a0-8412-2848-5
991			_bc-GenColl _hTR940 _i.I57 1994 _tCopy 1 _wBOOKS
991			_bc-GenColl _hTR940 _i.I57 1994 _p00015271966 _tCopy 2 _wCCF
999			_c1624 _d1624